The problem of crack formation in thin sublayers of silicon oxide during pulsed heating of interconnects

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Bibliographic Details
Main Author:	Arkadiy A. Skvortsov
Format:	Artículo científico
Language:	en
Published:	Universidad Nacional Autónoma de México 2021
Subjects:	Ingeniería Micro electro oxide films heat equation silicon oxide
Online Access:	Acceder al recurso 1 Acceder al recurso 2 Acceder al recurso 3 Acceder al recurso 4 Acceder al recurso 5
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