LOCAL ANODIC OXIDATION ON SILICON (100) SUBSTRATES USING ATOMIC FORCE MICROSCOPY
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| Format: | Artículo científico |
| Language: | en |
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Universidad Nacional de Colombia
2012
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| author | ALBA GRACIELA ÁVILA BERNAL |
| author_facet | ALBA GRACIELA ÁVILA BERNAL |
| contents | LOCAL ANODIC OXIDATION ON SILICON (100) SUBSTRATES USING ATOMIC FORCE MICROSCOPY ALBA GRACIELA ÁVILA BERNAL RUY SEBASTIÁN BONILLA Ingeniería LAO AFM Nano patterns A characterization of local anodic oxidation using scanning probe microscopy is performed on a (100) silicon substrate. The formation of patterns varies as a function of voltage, humidity, and scanning speed. A set of experiments is presented to analyze the voltage and scanning speed dependence under stable environmental conditions (50.5% relative humidity, 22 °C, and 767 mmHg). A finer control of the dimensions of the local oxidation patterns is attained at low voltages and low scanning speeds. Oxide ridges are observed at high voltages independently of the writing speed. Their presence sets up an upper limit for the oxide pattern formation. 2012 artículo científico 0012-7353 https://www.redalyc.org/articulo.oa?id=49623216009 en http://www.redalyc.org/revista.oa?id=496 Dyna application/pdf Universidad Nacional de Colombia Dyna (Colombia) Num.174 Vol.79 |
| format | Artículo científico |
| id | redalyc_49623216009 |
| institution | Redalyc |
| language | en |
| publishDate | 2012 |
| publisher | Universidad Nacional de Colombia |
| spellingShingle | LOCAL ANODIC OXIDATION ON SILICON (100) SUBSTRATES USING ATOMIC FORCE MICROSCOPY ALBA GRACIELA ÁVILA BERNAL Ingeniería LAO AFM Nano patterns LOCAL ANODIC OXIDATION ON SILICON (100) SUBSTRATES USING ATOMIC FORCE MICROSCOPY ALBA GRACIELA ÁVILA BERNAL RUY SEBASTIÁN BONILLA Ingeniería LAO AFM Nano patterns A characterization of local anodic oxidation using scanning probe microscopy is performed on a (100) silicon substrate. The formation of patterns varies as a function of voltage, humidity, and scanning speed. A set of experiments is presented to analyze the voltage and scanning speed dependence under stable environmental conditions (50.5% relative humidity, 22 °C, and 767 mmHg). A finer control of the dimensions of the local oxidation patterns is attained at low voltages and low scanning speeds. Oxide ridges are observed at high voltages independently of the writing speed. Their presence sets up an upper limit for the oxide pattern formation. 2012 artículo científico 0012-7353 https://www.redalyc.org/articulo.oa?id=49623216009 en http://www.redalyc.org/revista.oa?id=496 Dyna application/pdf Universidad Nacional de Colombia Dyna (Colombia) Num.174 Vol.79 |
| title | LOCAL ANODIC OXIDATION ON SILICON (100) SUBSTRATES USING ATOMIC FORCE MICROSCOPY |
| topic | Ingeniería LAO AFM Nano patterns |
| url | https://www.redalyc.org/articulo.oa?id=49623216009 |