Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications

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Bibliographic Details
Main Author:	Diana Shirley Galeano-Osorio
Format:	Artículo científico
Language:	en
Published:	Universidad Nacional de Colombia 2014
Subjects:	Ingeniería FTIR spectroscopy Raman spectroscopy Carbon nitride films substrate temperature
Online Access:	Acceder al recurso
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author	Diana Shirley Galeano-Osorio
author_facet	Diana Shirley Galeano-Osorio
contents	Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications Diana Shirley Galeano-Osorio Santiago Vargas Rogelio Ospina-Ospina Elisabeth Restrepo-Parra Pedro José Arango Ingeniería FTIR spectroscopy Raman spectroscopy Carbon nitride films substrate temperature Amorphous carbon nitride films have been obtained by pulsed cathodic arc at substrate temperatures of 20, 100, 150 and 200 °C. Film structure was investigated by Fourier Transformed infrared spectroscopy (FTIR) and Raman spectroscopy. Nitrile bands at approximately 2200 cm-1 were identified in all films. As the temperature increased a reduction in the concentration of sp3 bonds and a decrease in the structure disorder were observed. The relative intensity ratio of Raman D and G bands increased as the substrate temperature increased from 20 to 100°C. Nevertheless, at a critical temperature of 150°C, this trend was broken, and the film became amorphous. A peak at approximately 1610 cm-1 of films grown at 100°C, 150°C and 200 °C suggests that CNx is dominated by a relatively ordered graphite ring like glassy carbon. Moreover, the film grown at 150 °C presented the lowest roughness and the highest hardness and hemocompatibility. 2014 artículo científico 0012-7353 https://www.redalyc.org/articulo.oa?id=49631663012 en http://www.redalyc.org/revista.oa?id=496 Dyna application/pdf Universidad Nacional de Colombia Dyna (Colombia) Num.186 Vol.81
format	Artículo científico
id	redalyc_49631663012
language	en
publishDate	2014
publisher	Universidad Nacional de Colombia
spellingShingle	Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications Diana Shirley Galeano-Osorio Ingeniería FTIR spectroscopy Raman spectroscopy Carbon nitride films substrate temperature Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications Diana Shirley Galeano-Osorio Santiago Vargas Rogelio Ospina-Ospina Elisabeth Restrepo-Parra Pedro José Arango Ingeniería FTIR spectroscopy Raman spectroscopy Carbon nitride films substrate temperature Amorphous carbon nitride films have been obtained by pulsed cathodic arc at substrate temperatures of 20, 100, 150 and 200 °C. Film structure was investigated by Fourier Transformed infrared spectroscopy (FTIR) and Raman spectroscopy. Nitrile bands at approximately 2200 cm-1 were identified in all films. As the temperature increased a reduction in the concentration of sp3 bonds and a decrease in the structure disorder were observed. The relative intensity ratio of Raman D and G bands increased as the substrate temperature increased from 20 to 100°C. Nevertheless, at a critical temperature of 150°C, this trend was broken, and the film became amorphous. A peak at approximately 1610 cm-1 of films grown at 100°C, 150°C and 200 °C suggests that CNx is dominated by a relatively ordered graphite ring like glassy carbon. Moreover, the film grown at 150 °C presented the lowest roughness and the highest hardness and hemocompatibility. 2014 artículo científico 0012-7353 https://www.redalyc.org/articulo.oa?id=49631663012 en http://www.redalyc.org/revista.oa?id=496 Dyna application/pdf Universidad Nacional de Colombia Dyna (Colombia) Num.186 Vol.81
title	Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications
topic	Ingeniería FTIR spectroscopy Raman spectroscopy Carbon nitride films substrate temperature
url	https://www.redalyc.org/articulo.oa?id=49631663012

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