Monte Carlo simulation of epitaxial growth of GaInAsSb films

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Main Author: Jheison Alejandro Morales
Format: Artículo científico
Language:en
Published: Universidad Nacional de Colombia 2014
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author Jheison Alejandro Morales
author_facet Jheison Alejandro Morales
contents Monte Carlo simulation of epitaxial growth of GaInAsSb films Jheison Alejandro Morales Manuel Eduardo Ríos-Olaya Liliana Tirado-Mejía Ingeniería Keywords GaInAsSb Ising model Kinetic Monte Carlo liquid phase epitaxy Material engineering finds an important support on simulation m ethods. The study of semiconductors growth techniques through s imulation allows the determination of the influence of some growth parame ters on the film properties. Experimentally, the variations of these parameters are difficult due to the high experimental demands a nd expenses. In this work we present the numerical simulation o f the epitaxial growth of GaInAsSb by three methods. Devices based on this semiconductor material are thermophotovoltaic generators. The solid-on-solid approximation was used, considering the unit cel l formed by the four constituent elements, in the establish pro portions according to the choose stoichiometry. Through the Kinetic Mont e Carlo method we obtained a high coincidence between the simul ated film morphology and the obtained in the experimentally grown films. 2014 artículo científico 0012-7353 https://www.redalyc.org/articulo.oa?id=49632363024 en http://www.redalyc.org/revista.oa?id=496 Dyna application/pdf Universidad Nacional de Colombia Dyna (Colombia) Num.187 Vol.81
format Artículo científico
id redalyc_49632363024
institution Redalyc
language en
publishDate 2014
publisher Universidad Nacional de Colombia
spellingShingle Monte Carlo simulation of epitaxial growth of GaInAsSb films
Jheison Alejandro Morales
Ingeniería
Keywords
GaInAsSb
Ising model
Kinetic Monte Carlo
liquid phase epitaxy
Monte Carlo simulation of epitaxial growth of GaInAsSb films Jheison Alejandro Morales Manuel Eduardo Ríos-Olaya Liliana Tirado-Mejía Ingeniería Keywords GaInAsSb Ising model Kinetic Monte Carlo liquid phase epitaxy Material engineering finds an important support on simulation m ethods. The study of semiconductors growth techniques through s imulation allows the determination of the influence of some growth parame ters on the film properties. Experimentally, the variations of these parameters are difficult due to the high experimental demands a nd expenses. In this work we present the numerical simulation o f the epitaxial growth of GaInAsSb by three methods. Devices based on this semiconductor material are thermophotovoltaic generators. The solid-on-solid approximation was used, considering the unit cel l formed by the four constituent elements, in the establish pro portions according to the choose stoichiometry. Through the Kinetic Mont e Carlo method we obtained a high coincidence between the simul ated film morphology and the obtained in the experimentally grown films. 2014 artículo científico 0012-7353 https://www.redalyc.org/articulo.oa?id=49632363024 en http://www.redalyc.org/revista.oa?id=496 Dyna application/pdf Universidad Nacional de Colombia Dyna (Colombia) Num.187 Vol.81
title Monte Carlo simulation of epitaxial growth of GaInAsSb films
topic Ingeniería
Keywords
GaInAsSb
Ising model
Kinetic Monte Carlo
liquid phase epitaxy
url https://www.redalyc.org/articulo.oa?id=49632363024