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TiO2 and Al2O3 ultra thin nanolaminates growth by ALD; instrument automation and films characterization

Fuente: Redalyc

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Détails bibliographiques
Auteur principal:	H. Tiznado
Format:	Artículo científico
Langue:	en
Publié:	Sociedad Mexicana de Física A.C. 2012
Sujets:	Física, Astronomía y Matemáticas automation ellipsometry nanolaminates instrumentation Atomic layer deposition
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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