Deposition and computational analysis of WC thin films grown by PAPVD
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| Natura: | Artículo científico |
| Lingua: | en |
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Sociedad Mexicana de Física A.C.
2013
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| _version_ | 1876437659097759744 |
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| author | L. C. Agudelo Morimitsu |
| author_facet | L. C. Agudelo Morimitsu |
| contents | Deposition and computational analysis of WC thin films grown by PAPVD L. C. Agudelo Morimitsu R. Ospina Ospina J. M. González Carmona E. Restrepo Parra P. J. Arango Arango Física, Astronomía y Matemáticas WC DFT PAPVD Pulsed arc Tungsten carbide (WC) is considered a very important material used for industrial applications due to their high hardness and wear resistance. In this work the production of WC coatings using repetitive pulsed arc plasma assisted physical vapor deposition (PAPVD) system is studied. During the deposition process a W target was used as cathode. The atmosphere is a mixture of argon (50%) and methane (50%). As is known, the use of methane as precursor gas for WC production causes the formation of different phases such as WC and W 2 C. The power supply allows varying the pulses active and passive times, having a value which of 1 s. Coatings were characterized by X-Ray Diffraction (XRD) and X-Ray Photoelectron Spectroscopy (XPS) for determining their chemical composition, structure and stoichiometry. Density functional theory (DFT) methods were used for performing studies of the WC stability. It was carried out using computational techniques by means of charge distribution and molecular orbital, finding a transition from hybridization of de d shell to the f shell. 2013 artículo científico 0035-001X https://www.redalyc.org/articulo.oa?id=57030970018 en http://www.redalyc.org/revista.oa?id=570 Revista Mexicana de Física application/pdf Sociedad Mexicana de Física A.C. Revista Mexicana de Física (México) Num.1 Vol.59 |
| format | Artículo científico |
| id | redalyc_57030970018 |
| institution | Redalyc |
| language | en |
| publishDate | 2013 |
| publisher | Sociedad Mexicana de Física A.C. |
| spellingShingle | Deposition and computational analysis of WC thin films grown by PAPVD L. C. Agudelo Morimitsu Física, Astronomía y Matemáticas WC DFT PAPVD Pulsed arc Deposition and computational analysis of WC thin films grown by PAPVD L. C. Agudelo Morimitsu R. Ospina Ospina J. M. González Carmona E. Restrepo Parra P. J. Arango Arango Física, Astronomía y Matemáticas WC DFT PAPVD Pulsed arc Tungsten carbide (WC) is considered a very important material used for industrial applications due to their high hardness and wear resistance. In this work the production of WC coatings using repetitive pulsed arc plasma assisted physical vapor deposition (PAPVD) system is studied. During the deposition process a W target was used as cathode. The atmosphere is a mixture of argon (50%) and methane (50%). As is known, the use of methane as precursor gas for WC production causes the formation of different phases such as WC and W 2 C. The power supply allows varying the pulses active and passive times, having a value which of 1 s. Coatings were characterized by X-Ray Diffraction (XRD) and X-Ray Photoelectron Spectroscopy (XPS) for determining their chemical composition, structure and stoichiometry. Density functional theory (DFT) methods were used for performing studies of the WC stability. It was carried out using computational techniques by means of charge distribution and molecular orbital, finding a transition from hybridization of de d shell to the f shell. 2013 artículo científico 0035-001X https://www.redalyc.org/articulo.oa?id=57030970018 en http://www.redalyc.org/revista.oa?id=570 Revista Mexicana de Física application/pdf Sociedad Mexicana de Física A.C. Revista Mexicana de Física (México) Num.1 Vol.59 |
| title | Deposition and computational analysis of WC thin films grown by PAPVD |
| topic | Física, Astronomía y Matemáticas WC DFT PAPVD Pulsed arc |
| url | https://www.redalyc.org/articulo.oa?id=57030970018 |