Cobalt nitride films produced by reactive pulsed laser deposition
Fuente:
Redalyc
Guardado en:
| Autor principal: | |
|---|---|
| Formato: | Artículo científico |
| Lenguaje: | en |
| Publicado: |
Sociedad Mexicana de Física A.C.
2006
|
| Materias: | |
| Acceso en línea: | |
| Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
| _version_ | 1876427510487449600 |
|---|---|
| author | W. De La Cruz |
| author_facet | W. De La Cruz |
| contents | Cobalt nitride films produced by reactive pulsed laser deposition W. De La Cruz O. Contreras E. Perez-Tijerina G. Soto Física, Astronomía y Matemáticas thin films Cobalt nitride laser ablation ray photoelectron spectroscopy electron energy loss spectroscopy The nitrides of magnetic metal are becoming important due to their potential technological applications. In this work cobalt nitride thin filmsare deposited by reactive pulsed laser deposition (nitrogen environments) on silicon substrates at room temperature. The resultant films arecharacterized in-situ by Auger, X-Ray Photoelectron and Electron Energy Loss Spectroscopies. The chemical bond of the CoNx is stronglylinked to the stoichiometry, and it can be controlled by the N background pressure. We conclude that this deposition method offers a meansfor fine-tuning the properties of cobalt nitride 2006 artículo científico 0035-001X https://www.redalyc.org/articulo.oa?id=57065304 en http://www.redalyc.org/revista.oa?id=570 Revista Mexicana de Física application/pdf Sociedad Mexicana de Física A.C. Revista Mexicana de Física (México) Num.5 Vol.52 |
| format | Artículo científico |
| id | redalyc_57065304 |
| institution | Redalyc |
| language | en |
| publishDate | 2006 |
| publisher | Sociedad Mexicana de Física A.C. |
| spellingShingle | Cobalt nitride films produced by reactive pulsed laser deposition W. De La Cruz Física, Astronomía y Matemáticas thin films Cobalt nitride laser ablation ray photoelectron spectroscopy electron energy loss spectroscopy Cobalt nitride films produced by reactive pulsed laser deposition W. De La Cruz O. Contreras E. Perez-Tijerina G. Soto Física, Astronomía y Matemáticas thin films Cobalt nitride laser ablation ray photoelectron spectroscopy electron energy loss spectroscopy The nitrides of magnetic metal are becoming important due to their potential technological applications. In this work cobalt nitride thin filmsare deposited by reactive pulsed laser deposition (nitrogen environments) on silicon substrates at room temperature. The resultant films arecharacterized in-situ by Auger, X-Ray Photoelectron and Electron Energy Loss Spectroscopies. The chemical bond of the CoNx is stronglylinked to the stoichiometry, and it can be controlled by the N background pressure. We conclude that this deposition method offers a meansfor fine-tuning the properties of cobalt nitride 2006 artículo científico 0035-001X https://www.redalyc.org/articulo.oa?id=57065304 en http://www.redalyc.org/revista.oa?id=570 Revista Mexicana de Física application/pdf Sociedad Mexicana de Física A.C. Revista Mexicana de Física (México) Num.5 Vol.52 |
| title | Cobalt nitride films produced by reactive pulsed laser deposition |
| topic | Física, Astronomía y Matemáticas thin films Cobalt nitride laser ablation ray photoelectron spectroscopy electron energy loss spectroscopy |
| url | https://www.redalyc.org/articulo.oa?id=57065304 |