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Bibliographic Details
Main Author: W. De La Cruz
Format: Artículo científico
Language:en
Published: Sociedad Mexicana de Física A.C. 2006
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Online Access:https://www.redalyc.org/articulo.oa?id=57065304
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author W. De La Cruz
author_facet W. De La Cruz
contents Cobalt nitride films produced by reactive pulsed laser deposition W. De La Cruz O. Contreras E. Perez-Tijerina G. Soto Física, Astronomía y Matemáticas thin films Cobalt nitride laser ablation ray photoelectron spectroscopy electron energy loss spectroscopy The nitrides of magnetic metal are becoming important due to their potential technological applications. In this work cobalt nitride thin filmsare deposited by reactive pulsed laser deposition (nitrogen environments) on silicon substrates at room temperature. The resultant films arecharacterized in-situ by Auger, X-Ray Photoelectron and Electron Energy Loss Spectroscopies. The chemical bond of the CoNx is stronglylinked to the stoichiometry, and it can be controlled by the N background pressure. We conclude that this deposition method offers a meansfor fine-tuning the properties of cobalt nitride 2006 artículo científico 0035-001X https://www.redalyc.org/articulo.oa?id=57065304 en http://www.redalyc.org/revista.oa?id=570 Revista Mexicana de Física application/pdf Sociedad Mexicana de Física A.C. Revista Mexicana de Física (México) Num.5 Vol.52
format Artículo científico
id redalyc_57065304
language en
publishDate 2006
publisher Sociedad Mexicana de Física A.C.
spellingShingle Cobalt nitride films produced by reactive pulsed laser deposition
W. De La Cruz
Física, Astronomía y Matemáticas
thin films
Cobalt nitride
laser ablation
ray photoelectron spectroscopy
electron energy loss spectroscopy
Cobalt nitride films produced by reactive pulsed laser deposition W. De La Cruz O. Contreras E. Perez-Tijerina G. Soto Física, Astronomía y Matemáticas thin films Cobalt nitride laser ablation ray photoelectron spectroscopy electron energy loss spectroscopy The nitrides of magnetic metal are becoming important due to their potential technological applications. In this work cobalt nitride thin filmsare deposited by reactive pulsed laser deposition (nitrogen environments) on silicon substrates at room temperature. The resultant films arecharacterized in-situ by Auger, X-Ray Photoelectron and Electron Energy Loss Spectroscopies. The chemical bond of the CoNx is stronglylinked to the stoichiometry, and it can be controlled by the N background pressure. We conclude that this deposition method offers a meansfor fine-tuning the properties of cobalt nitride 2006 artículo científico 0035-001X https://www.redalyc.org/articulo.oa?id=57065304 en http://www.redalyc.org/revista.oa?id=570 Revista Mexicana de Física application/pdf Sociedad Mexicana de Física A.C. Revista Mexicana de Física (México) Num.5 Vol.52
title Cobalt nitride films produced by reactive pulsed laser deposition
topic Física, Astronomía y Matemáticas
thin films
Cobalt nitride
laser ablation
ray photoelectron spectroscopy
electron energy loss spectroscopy
url https://www.redalyc.org/articulo.oa?id=57065304