Technological stress and the intention to stay in organizations: Do the quality of life and work-home conflict mediate this relationship?

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Bibliographic Details
Main Author:	Ozaias Wagner Ferreira de Carvalho
Format:	Artículo científico
Language:	en
Published:	Universidade Federal do Ceará 2021
Subjects:	Administración y Contabilidad work technostress
Online Access:	Acceder al recurso 1 Acceder al recurso 2
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