The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films
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| Formato: | Artículo científico |
| Lenguaje: | en |
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Universidad Nacional de Colombia
2012
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| _version_ | 1876433555270139904 |
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| author | L. Velasco |
| author_facet | L. Velasco |
| contents | The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films L. Velasco J. J. Olaya R. Rodríguez-Baracaldo Ingeniería x ray polar isation Corrosion thin film NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascer-tained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A micro-structural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance. 2012 artículo científico 0120-5609 https://www.redalyc.org/articulo.oa?id=64324939003 en http://www.redalyc.org/revista.oa?id=643 Ingeniería e Investigación application/pdf Universidad Nacional de Colombia Ingeniería e Investigación (Colombia) Num.3 Vol.32 |
| format | Artículo científico |
| id | redalyc_64324939003 |
| institution | Redalyc |
| language | en |
| publishDate | 2012 |
| publisher | Universidad Nacional de Colombia |
| spellingShingle | The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films L. Velasco Ingeniería x ray polar isation Corrosion thin film The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films L. Velasco J. J. Olaya R. Rodríguez-Baracaldo Ingeniería x ray polar isation Corrosion thin film NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascer-tained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A micro-structural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance. 2012 artículo científico 0120-5609 https://www.redalyc.org/articulo.oa?id=64324939003 en http://www.redalyc.org/revista.oa?id=643 Ingeniería e Investigación application/pdf Universidad Nacional de Colombia Ingeniería e Investigación (Colombia) Num.3 Vol.32 |
| title | The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films |
| topic | Ingeniería x ray polar isation Corrosion thin film |
| url | https://www.redalyc.org/articulo.oa?id=64324939003 |