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A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method

Fuente: Redalyc

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Détails bibliographiques
Auteur principal:	F. Hernandez-Guzman
Format:	Artículo científico
Langue:	en
Publié:	Universidad de Sonora 2023
Sujets:	Multidisciplinaria (Ciencias Naturales y Exactas) spin coated thin films porous morphology Cobalt doped vanadium oxide solution processing without ligands
Accès en ligne:	Acceder al recurso 1 Acceder al recurso 2 Acceder al recurso 3 Acceder al recurso 4 Acceder al recurso 5
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