Propiedades ópticas y eléctricas de películas delgadas de CuO
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| Format: | Artículo científico |
| Langue: | es |
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Universidad de Carabobo
2016
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| _version_ | 1876472495358345216 |
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| author | Yannirys López |
| author_facet | Yannirys López |
| contents | Propiedades ópticas y eléctricas de películas delgadas de CuO Yannirys López Luciana Scarioni D. Ingeniería resistivity Ellipsometry thermal oxidation activation energy thermal evaporation CuO thin films were fabricated by evaporation and thermal oxidation on glass substrates. Through thermal oxidation technique, CuO films were formed at temperatures above 200C. Obtaining CuO films by thermal evaporation technique was possible by performing resistive heating a mixture of Cu / CuO in the ratio 1/9. The optical constants of the produced films (real and imaginary index of refraction), were determined from ellipsometry technique. Resistivity surveys returned values of 120 .cm to CuO films made by 100 nm obtaining techniques employed. An activation energy of 0.21 eV was obtained from the resistivity curves for the films of 100 nm compared to the 0.32 eV value obtained for films of 20 nm. These differences are attributed to the dependence of the electrical properties with the manufacturing method. 2016 artículo científico 1316-6832 https://www.redalyc.org/articulo.oa?id=70748810007 es http://www.redalyc.org/revista.oa?id=707 Revista INGENIERÍA UC application/pdf Universidad de Carabobo Revista INGENIERÍA UC (República Bolivariana de Venezuela) Num.3 Vol.23 |
| format | Artículo científico |
| id | redalyc_70748810007 |
| institution | Redalyc |
| language | es |
| publishDate | 2016 |
| publisher | Universidad de Carabobo |
| spellingShingle | Propiedades ópticas y eléctricas de películas delgadas de CuO Yannirys López Ingeniería resistivity Ellipsometry thermal oxidation activation energy thermal evaporation Propiedades ópticas y eléctricas de películas delgadas de CuO Yannirys López Luciana Scarioni D. Ingeniería resistivity Ellipsometry thermal oxidation activation energy thermal evaporation CuO thin films were fabricated by evaporation and thermal oxidation on glass substrates. Through thermal oxidation technique, CuO films were formed at temperatures above 200C. Obtaining CuO films by thermal evaporation technique was possible by performing resistive heating a mixture of Cu / CuO in the ratio 1/9. The optical constants of the produced films (real and imaginary index of refraction), were determined from ellipsometry technique. Resistivity surveys returned values of 120 .cm to CuO films made by 100 nm obtaining techniques employed. An activation energy of 0.21 eV was obtained from the resistivity curves for the films of 100 nm compared to the 0.32 eV value obtained for films of 20 nm. These differences are attributed to the dependence of the electrical properties with the manufacturing method. 2016 artículo científico 1316-6832 https://www.redalyc.org/articulo.oa?id=70748810007 es http://www.redalyc.org/revista.oa?id=707 Revista INGENIERÍA UC application/pdf Universidad de Carabobo Revista INGENIERÍA UC (República Bolivariana de Venezuela) Num.3 Vol.23 |
| title | Propiedades ópticas y eléctricas de películas delgadas de CuO |
| topic | Ingeniería resistivity Ellipsometry thermal oxidation activation energy thermal evaporation |
| url | https://www.redalyc.org/articulo.oa?id=70748810007 |