Methods Employed in Optical Emission Spectroscopy Analysis: a Review
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| Natura: | Artículo científico |
| Lingua: | en |
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Universidad EAFIT
2015
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| _version_ | 1876464861633839104 |
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| author | D. M. Devia |
| author_facet | D. M. Devia |
| contents | Methods Employed in Optical Emission Spectroscopy Analysis: a Review D. M. Devia L. V. Rodriguez-Restrepo E. Restrepo-Parra Ingeniería OES shifting broadening line intensity plasma parameters In this work, different methods employed for the analysis of emission spectra are presented. The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films. Some of these techniques include magnetron sputtering and arc discharges. Initially, some fundamental physical principles that support the Optical Emission Spectroscopy (OES) technique are described; then, some rules to consider during the spectral analysis to avoid ambiguities are listed. Finally, some of the more frequently used spectroscopic methods for determining the physical properties of plasma are described. 2015 artículo científico 1794-9165 https://www.redalyc.org/articulo.oa?id=83533766012 en http://www.redalyc.org/revista.oa?id=835 Ingeniería y Ciencia application/pdf Universidad EAFIT Ingeniería y Ciencia (Colombia) Num.21 Vol.11 |
| format | Artículo científico |
| id | redalyc_83533766012 |
| institution | Redalyc |
| language | en |
| publishDate | 2015 |
| publisher | Universidad EAFIT |
| spellingShingle | Methods Employed in Optical Emission Spectroscopy Analysis: a Review D. M. Devia Ingeniería OES shifting broadening line intensity plasma parameters Methods Employed in Optical Emission Spectroscopy Analysis: a Review D. M. Devia L. V. Rodriguez-Restrepo E. Restrepo-Parra Ingeniería OES shifting broadening line intensity plasma parameters In this work, different methods employed for the analysis of emission spectra are presented. The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films. Some of these techniques include magnetron sputtering and arc discharges. Initially, some fundamental physical principles that support the Optical Emission Spectroscopy (OES) technique are described; then, some rules to consider during the spectral analysis to avoid ambiguities are listed. Finally, some of the more frequently used spectroscopic methods for determining the physical properties of plasma are described. 2015 artículo científico 1794-9165 https://www.redalyc.org/articulo.oa?id=83533766012 en http://www.redalyc.org/revista.oa?id=835 Ingeniería y Ciencia application/pdf Universidad EAFIT Ingeniería y Ciencia (Colombia) Num.21 Vol.11 |
| title | Methods Employed in Optical Emission Spectroscopy Analysis: a Review |
| topic | Ingeniería OES shifting broadening line intensity plasma parameters |
| url | https://www.redalyc.org/articulo.oa?id=83533766012 |