In situ electron-beam processing for III-V semiconductor nanostructure fabrication
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| Natura: | Artículo científico |
| Lingua: | en |
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Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| _version_ | 1876480943804383232 |
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| author | Tomonori Ishikawa |
| author_facet | Tomonori Ishikawa |
| contents | In situ electron-beam processing for III-V semiconductor nanostructure fabrication Tomonori Ishikawa Shigeru Kohmoto Tetsuya Nishimura Kiyoshi Asakawa Física, Astronomía y Matemáticas Quantum dots (QDs) and quantum wires (QWRs) are promising for future optoelectronic device applications. To realize the expected performances of devices using such semiconductor nanostructures, the sites and sizes of the nanostructures must be effectively controlled. For this purpose, we have developed nano fabrication technology using in situ electronbeam lithography and self-organizing molecular-beam epitaxial growth. Using this method, fine holes were formed on GaAs surfaces, and then a few monolayers of InAs were supplied to form QDs. It was revealed that the resulting QDs were selectively formed in the holes, without any QD formation in the flat region between the holes, because of accumulation of In atoms in the holes. This result demonstrates the usefulness of the in situ patterning/self-organizing growth approach for realizing arbitrarily arranged nanostructures 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200903 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| format | Artículo científico |
| id | redalyc_94200903 |
| institution | Redalyc |
| language | en |
| publishDate | 1999 |
| publisher | Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. |
| spellingShingle | In situ electron-beam processing for III-V semiconductor nanostructure fabrication Tomonori Ishikawa Física, Astronomía y Matemáticas In situ electron-beam processing for III-V semiconductor nanostructure fabrication Tomonori Ishikawa Shigeru Kohmoto Tetsuya Nishimura Kiyoshi Asakawa Física, Astronomía y Matemáticas Quantum dots (QDs) and quantum wires (QWRs) are promising for future optoelectronic device applications. To realize the expected performances of devices using such semiconductor nanostructures, the sites and sizes of the nanostructures must be effectively controlled. For this purpose, we have developed nano fabrication technology using in situ electronbeam lithography and self-organizing molecular-beam epitaxial growth. Using this method, fine holes were formed on GaAs surfaces, and then a few monolayers of InAs were supplied to form QDs. It was revealed that the resulting QDs were selectively formed in the holes, without any QD formation in the flat region between the holes, because of accumulation of In atoms in the holes. This result demonstrates the usefulness of the in situ patterning/self-organizing growth approach for realizing arbitrarily arranged nanostructures 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200903 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| title | In situ electron-beam processing for III-V semiconductor nanostructure fabrication |
| topic | Física, Astronomía y Matemáticas |
| url | https://www.redalyc.org/articulo.oa?id=94200903 |