Mechanical properties of boron nitride thin films obtained by rf-pecvd at low temperatures
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| Format: | Artículo científico |
| Language: | en |
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Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| _version_ | 1876462288287825920 |
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| author | J. Vilcarromero |
| author_facet | J. Vilcarromero |
| contents | Mechanical properties of boron nitride thin films obtained by rf-pecvd at low temperatures J. Vilcarromero M.N.P. Carreno I. Pereyra Física, Astronomía y Matemáticas This work describes the thermomechanical and structural modifications in RF-PECVD boron nitride thin films induced by the deposition conditions. The samples were prepared at low temperatures (below 400 oC) using B2H6, N2 and H2 gaseous mixtures. The B2H6/N2 flow ratios, the B2H6 flow, the N2 flow, the substrate temperature the RF power and the H2 dilution were varied. The thermomechanical properties, as stress and hardness, are also studied and correlated with the structural properties. It is found that the films present a mixture of hexagonal and amorphous phases and, under certain conditions, evidences of cubic phase. The fraction of these phases as well as the crystallite size, deduced by Raman spectroscopy, depend strongly on the B2H6 flow, the B2H6/N2 flow ratio and on the H2 dilution. Boron to Nitrogen ratio, close to stoichiometry was obtained for all the studied samples 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200927 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| format | Artículo científico |
| id | redalyc_94200927 |
| institution | Redalyc |
| language | en |
| publishDate | 1999 |
| publisher | Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. |
| spellingShingle | Mechanical properties of boron nitride thin films obtained by rf-pecvd at low temperatures J. Vilcarromero Física, Astronomía y Matemáticas Mechanical properties of boron nitride thin films obtained by rf-pecvd at low temperatures J. Vilcarromero M.N.P. Carreno I. Pereyra Física, Astronomía y Matemáticas This work describes the thermomechanical and structural modifications in RF-PECVD boron nitride thin films induced by the deposition conditions. The samples were prepared at low temperatures (below 400 oC) using B2H6, N2 and H2 gaseous mixtures. The B2H6/N2 flow ratios, the B2H6 flow, the N2 flow, the substrate temperature the RF power and the H2 dilution were varied. The thermomechanical properties, as stress and hardness, are also studied and correlated with the structural properties. It is found that the films present a mixture of hexagonal and amorphous phases and, under certain conditions, evidences of cubic phase. The fraction of these phases as well as the crystallite size, deduced by Raman spectroscopy, depend strongly on the B2H6 flow, the B2H6/N2 flow ratio and on the H2 dilution. Boron to Nitrogen ratio, close to stoichiometry was obtained for all the studied samples 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200927 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| title | Mechanical properties of boron nitride thin films obtained by rf-pecvd at low temperatures |
| topic | Física, Astronomía y Matemáticas |
| url | https://www.redalyc.org/articulo.oa?id=94200927 |