Properties of DLC and CNx PECVD coatings

Fuente: Redalyc
Salvato in:
Dettagli Bibliografici
Autore principale: F. Cerny
Natura: Artículo científico
Lingua:en
Pubblicazione: Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 1999
Soggetti:
Accesso online:
Tags: Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne!!
_version_ 1876460850743607296
author F. Cerny
author_facet F. Cerny
contents Properties of DLC and CNx PECVD coatings F. Cerny J. Gurovic J. Smolik J. Macl Z. Bryknar V. Hnatowicz Física, Astronomía y Matemáticas DLC coating CNx coating PECVD method Carbon based thin films have been prepared by PECVD method. Silicon and steel substrates were used for thin films preparation. Deposition was carried out under various conditions. Plasma was generated by RF (13.56 MHz) discharge. Investigation of theproperties of deposited thin films has been carried out by IR spectroscopy, Raman spectroscopy, X-ray diffraction, proton scattering, scanning electron microscopy and by measurement of Vickers microhardness. Various bonds between carbon, nitrogen, hydrogen and also oxygen were observed. For all the conditions used the coatings were amorphous. In the case of thicker coatings bad adhesion was observed on both substrates 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200933 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9
format Artículo científico
id redalyc_94200933
institution Redalyc
language en
publishDate 1999
publisher Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
spellingShingle Properties of DLC and CNx PECVD coatings
F. Cerny
Física, Astronomía y Matemáticas
DLC coating
CNx coating
PECVD method
Properties of DLC and CNx PECVD coatings F. Cerny J. Gurovic J. Smolik J. Macl Z. Bryknar V. Hnatowicz Física, Astronomía y Matemáticas DLC coating CNx coating PECVD method Carbon based thin films have been prepared by PECVD method. Silicon and steel substrates were used for thin films preparation. Deposition was carried out under various conditions. Plasma was generated by RF (13.56 MHz) discharge. Investigation of theproperties of deposited thin films has been carried out by IR spectroscopy, Raman spectroscopy, X-ray diffraction, proton scattering, scanning electron microscopy and by measurement of Vickers microhardness. Various bonds between carbon, nitrogen, hydrogen and also oxygen were observed. For all the conditions used the coatings were amorphous. In the case of thicker coatings bad adhesion was observed on both substrates 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200933 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9
title Properties of DLC and CNx PECVD coatings
topic Física, Astronomía y Matemáticas
DLC coating
CNx coating
PECVD method
url https://www.redalyc.org/articulo.oa?id=94200933