Characterization of sputtered Ta-Ru thin films for ink-jet heater applications
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| Format: | Artículo científico |
| Langue: | en |
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Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| _version_ | 1876432138557980672 |
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| author | C. C. Chan |
| author_facet | C. C. Chan |
| contents | Characterization of sputtered Ta-Ru thin films for ink-jet heater applications C. C. Chan H. Horng D. S. Wuu Física, Astronomía y Matemáticas This paper discusses structural, electrical and oxidation characteristics of co-sputtered Ta-Ru alloy films on oxidized Si substrates. From x-ray examination, a Ta1Ru1 phase is formed and dominates in the compositions exceeding 54 at. % Ru content. The resistivity of the Ta-Ru thin films can reach a maximum of ~320 mW-cm in the composition range between 35 and 54 at. % Ru. After thermal treatment in air (600°C, 1 h), Ru-rich samples show a smaller increase in resistivity than Tarich ones. The observed preferential oxidation of Ta in the Ta-Ru samples can be further interpreted by thermodynamic calculations. The Tarich surface oxide is believed to be responsible for the passivating ability of Ru for oxidation at high temperatures. This results in the formation of Ru in metallic state, though the oxidation of Ta occurs. Finally, the Ta-Ru thin films without any additional passivation were fabricated in heater arrays to perform the inkjet lifetime test. A lifetime over 1,107 driving pulses can be achieved, which indicates Ta-Ru has high potential in thermal ink-jet applications 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200948 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| format | Artículo científico |
| id | redalyc_94200948 |
| institution | Redalyc |
| language | en |
| publishDate | 1999 |
| publisher | Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. |
| spellingShingle | Characterization of sputtered Ta-Ru thin films for ink-jet heater applications C. C. Chan Física, Astronomía y Matemáticas Characterization of sputtered Ta-Ru thin films for ink-jet heater applications C. C. Chan H. Horng D. S. Wuu Física, Astronomía y Matemáticas This paper discusses structural, electrical and oxidation characteristics of co-sputtered Ta-Ru alloy films on oxidized Si substrates. From x-ray examination, a Ta1Ru1 phase is formed and dominates in the compositions exceeding 54 at. % Ru content. The resistivity of the Ta-Ru thin films can reach a maximum of ~320 mW-cm in the composition range between 35 and 54 at. % Ru. After thermal treatment in air (600°C, 1 h), Ru-rich samples show a smaller increase in resistivity than Tarich ones. The observed preferential oxidation of Ta in the Ta-Ru samples can be further interpreted by thermodynamic calculations. The Tarich surface oxide is believed to be responsible for the passivating ability of Ru for oxidation at high temperatures. This results in the formation of Ru in metallic state, though the oxidation of Ta occurs. Finally, the Ta-Ru thin films without any additional passivation were fabricated in heater arrays to perform the inkjet lifetime test. A lifetime over 1,107 driving pulses can be achieved, which indicates Ta-Ru has high potential in thermal ink-jet applications 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200948 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| title | Characterization of sputtered Ta-Ru thin films for ink-jet heater applications |
| topic | Física, Astronomía y Matemáticas |
| url | https://www.redalyc.org/articulo.oa?id=94200948 |