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| Format: | Artículo científico |
| Language: | en |
| Published: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| Online Access: | https://www.redalyc.org/articulo.oa?id=94200970 |
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Table of Contents:
- Characterization of diamond-like carbon (DLC) thin films prepared by r.f. magnetron sputtering C. Rincón H. Galindo G. Zambrano N. Alba P. Prieto Física, Astronomía y Matemáticas Diamond-Like Carbon (DLC) thin films were deposited on stainless steel and silicon substrates by a r.f. (13.56 MHz) magnetron sputtering technique. A carbon target (99,99%) and a gas mixture of Ar/CH4 were used. During the deposition process the plasma discharge was monitored by Optical Emission Spectroscopy (OES) in order to analyze the state of the chemical species present in the plasma. The films were characterized by Raman Spectroscopy and by Reflection Absorption and Transmission Infrared Spectroscopy. The morphology of the deposited layers was analyzed by Scanning Electron Microscopy (SEM). The Raman intensity of the diamond and graphite peaks (ID/IG) depends on the percentage of CH4 in the gas mixture. The relationship between the lines Ha, and Hb, intensities are a measure of the relative change of the plasma electronic temperature that, for the experiment conditions, does not depend significantly on the concentration of CH4 in the mixture and its value was of the order of 1 eV. Optical Emission Spectroscopy shows that, besides of the atomic hydrogen peak (Ha, Hb, Hg), emission spectra are dominated by neutral CH species and the most intense peak in the spectra correspond to CH (A2D ® X2 P at 431,5 nm) which is supposed to be the precursor species in the diamond-like films, beside in the Transmission Infrared Spectroscopy analysis were observed the sp3 CH2 symmetric and asymmetric at 2870 and 2960 cm-1 peaks. These peaks have been observed in diamond deposited at very high CH4 concentrations and also in diamond like carbon (DLC) films 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200970 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9