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Bibliographic Details
Main Author: A. I. Oliva
Format: Artículo científico
Language:en
Published: Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 1999
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Online Access:https://www.redalyc.org/articulo.oa?id=94200973
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Table of Contents:
  • Thickness effects on aluminum thin films A. I. Oliva O. Ceh J.E. Corona P. Quintana M. Aguilar Física, Astronomía y Matemáticas Aluminium thin films grown with different thickness on silicon substrates were analyzed by atomic force microscopy and grazing incidence x-ray techniques. Stress on surface film was found to be greater as the thickness increases because of the substrate history. Roughness measurements made on the AFM images shown a linear increase with thickness and an asintotic behavior with time after growth. As the film thickness increases, the (111) peak intensity increases relative to the (200) and (220) peaks 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200973 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9