Laser deposition of CNx films combined with RF and hollow cathode discharges
Fuente:
Redalyc
Enregistré dans:
| Auteur principal: | |
|---|---|
| Format: | Artículo científico |
| Langue: | en |
| Publié: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
|
| Sujets: | |
| Accès en ligne: | |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|
| _version_ | 1876441027129114624 |
|---|---|
| author | J. Lanèok |
| author_facet | J. Lanèok |
| contents | Laser deposition of CNx films combined with RF and hollow cathode discharges J. Lanèok L. Jastrabík L. Soukup Z. Zelinger M. Simeèková M. Jelínek Física, Astronomía y Matemáticas laser deposition carbon nitride films radiofrequency discharge hollow cathode discharge optical emission spectroscopy Pulsed laser deposition (PLD) combined with additional RF and hollow cathode (HC) discharges for deposition of CNx films are studied. The RF discharge was held between two electrodes situated parallel to plasma plume from a graphite target. Influence of RF power, nitrogen pressure, modulation frequency and modulation pulse rate on nitrogen content was observed. The production of nitrogen species in the RF discharge was observed by optical emission spectroscopy (OES). In PLD combined with RF and HC discharges one of the RF electrodes was used to supply nitrogen gas on the substrate. Films were characterized by WDX, XRD and by scratch and microhardness testers. The nitrogen content in CNx films sharply increased with additional discharges. An N/C ratio higher than 1.1 was measured 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200980 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| format | Artículo científico |
| id | redalyc_94200980 |
| institution | Redalyc |
| language | en |
| publishDate | 1999 |
| publisher | Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. |
| spellingShingle | Laser deposition of CNx films combined with RF and hollow cathode discharges J. Lanèok Física, Astronomía y Matemáticas laser deposition carbon nitride films radiofrequency discharge hollow cathode discharge optical emission spectroscopy Laser deposition of CNx films combined with RF and hollow cathode discharges J. Lanèok L. Jastrabík L. Soukup Z. Zelinger M. Simeèková M. Jelínek Física, Astronomía y Matemáticas laser deposition carbon nitride films radiofrequency discharge hollow cathode discharge optical emission spectroscopy Pulsed laser deposition (PLD) combined with additional RF and hollow cathode (HC) discharges for deposition of CNx films are studied. The RF discharge was held between two electrodes situated parallel to plasma plume from a graphite target. Influence of RF power, nitrogen pressure, modulation frequency and modulation pulse rate on nitrogen content was observed. The production of nitrogen species in the RF discharge was observed by optical emission spectroscopy (OES). In PLD combined with RF and HC discharges one of the RF electrodes was used to supply nitrogen gas on the substrate. Films were characterized by WDX, XRD and by scratch and microhardness testers. The nitrogen content in CNx films sharply increased with additional discharges. An N/C ratio higher than 1.1 was measured 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200980 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| title | Laser deposition of CNx films combined with RF and hollow cathode discharges |
| topic | Física, Astronomía y Matemáticas laser deposition carbon nitride films radiofrequency discharge hollow cathode discharge optical emission spectroscopy |
| url | https://www.redalyc.org/articulo.oa?id=94200980 |