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High deposition rate a-Si:H layers from pure SiH4 and from a 10% dilution of SiH4 in H2

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Détails bibliographiques
Auteur principal:	M. Estrada
Format:	Artículo científico
Langue:	en
Publié:	Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 1999
Sujets:	Física, Astronomía y Matemáticas
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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