Laser deposition of waveguiding Ti: sapphire and chalcogenide glass AsS films
Fuente:
Redalyc
Saved in:
| Main Author: | |
|---|---|
| Format: | Artículo científico |
| Language: | en |
| Published: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
|
| Subjects: | |
| Online Access: | |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| _version_ | 1876422314942267392 |
|---|---|
| author | J. Oswald |
| author_facet | J. Oswald |
| contents | Laser deposition of waveguiding Ti: sapphire and chalcogenide glass AsS films J. Oswald K. Jurek F. Flory M. Frumar J. Lanèok M. Jelínek L. Jastrabík L. Soukup Física, Astronomía y Matemáticas thin films Ti: sapphire laser deposition chalcogenide glass Waveguiding Ti:sapphire on quartz and chalcogenide glass on fused silica substrates were prepared by pulse laser deposition. Ti: sapphire films were deposited at 500 oC from 0.48 wt% of Ti2O3. After annealing the high textured films were obtained, exhibiting attenuation 6-7 dBcm-1 were obtained. Inhomogeneity of thickness and refractive index of deposited films were checked by m-line technique. Chalcogenide As40S60 films were deposited at an energy density range from 1.9 J/cm2 to 5.7 Jcm2. It was found that the stoichiometry, optical density in visible spectral region, index of refraction and waveguiding properties of As40S60 films changed with deposition conditions 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200984 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| format | Artículo científico |
| id | redalyc_94200984 |
| institution | Redalyc |
| language | en |
| publishDate | 1999 |
| publisher | Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. |
| spellingShingle | Laser deposition of waveguiding Ti: sapphire and chalcogenide glass AsS films J. Oswald Física, Astronomía y Matemáticas thin films Ti: sapphire laser deposition chalcogenide glass Laser deposition of waveguiding Ti: sapphire and chalcogenide glass AsS films J. Oswald K. Jurek F. Flory M. Frumar J. Lanèok M. Jelínek L. Jastrabík L. Soukup Física, Astronomía y Matemáticas thin films Ti: sapphire laser deposition chalcogenide glass Waveguiding Ti:sapphire on quartz and chalcogenide glass on fused silica substrates were prepared by pulse laser deposition. Ti: sapphire films were deposited at 500 oC from 0.48 wt% of Ti2O3. After annealing the high textured films were obtained, exhibiting attenuation 6-7 dBcm-1 were obtained. Inhomogeneity of thickness and refractive index of deposited films were checked by m-line technique. Chalcogenide As40S60 films were deposited at an energy density range from 1.9 J/cm2 to 5.7 Jcm2. It was found that the stoichiometry, optical density in visible spectral region, index of refraction and waveguiding properties of As40S60 films changed with deposition conditions 1999 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94200984 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.9 |
| title | Laser deposition of waveguiding Ti: sapphire and chalcogenide glass AsS films |
| topic | Física, Astronomía y Matemáticas thin films Ti: sapphire laser deposition chalcogenide glass |
| url | https://www.redalyc.org/articulo.oa?id=94200984 |