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Short thermal annealing for crystallization of plasma-CVD amorphous silicon films

Fuente: Redalyc

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Detalles Bibliográficos
Autor principal:	Yasuhiro Matsumoto
Formato:	Artículo científico
Lenguaje:	es
Publicado:	Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 2000
Materias:	Física, Astronomía y Matemáticas
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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