Mole fraction modification of binary alloys during thermal evaporation
Fuente:
Redalyc
Saved in:
| Main Author: | |
|---|---|
| Format: | Artículo científico |
| Language: | en |
| Published: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2000
|
| Subjects: | |
| Online Access: | |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| _version_ | 1876437083556413440 |
|---|---|
| author | A. Zehe |
| author_facet | A. Zehe |
| contents | Mole fraction modification of binary alloys during thermal evaporation A. Zehe A. Ramírez Física, Astronomía y Matemáticas thin film binary alloys mole fraction vapor pressure Thermal evaporation of binary alloys occurs in a number of practical applications, as e.g. in the fabrication of electricalresistors by use of a Cr-Ni alloy. The chemical composition of the alloy determines the physical properties of thedeposited film. During the evaporation process the number of atoms of both species and thus source, vapor and thin filmcompositions are continuously changed, with possible adverse effects on the film properties. In order to maintain highquality features in mass production of devices and components, it is important to know the mass fraction that may beevaporated without modifying too much the intented composition of the thin film of the binary alloy. The present paperdescribes a theoretical analysis of the evaporation behavior of a molten binary alloy through changes in the chemicalcomposition of the source, the vapor, and the thin film during the process. We employed Roults law to described therelation between partial vapor pressure and composition for an ideal alloy and for the evaporation of pure metals theHertz-Knudsen equation 2000 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94201105 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.11 |
| format | Artículo científico |
| id | redalyc_94201105 |
| institution | Redalyc |
| language | en |
| publishDate | 2000 |
| publisher | Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. |
| spellingShingle | Mole fraction modification of binary alloys during thermal evaporation A. Zehe Física, Astronomía y Matemáticas thin film binary alloys mole fraction vapor pressure Mole fraction modification of binary alloys during thermal evaporation A. Zehe A. Ramírez Física, Astronomía y Matemáticas thin film binary alloys mole fraction vapor pressure Thermal evaporation of binary alloys occurs in a number of practical applications, as e.g. in the fabrication of electricalresistors by use of a Cr-Ni alloy. The chemical composition of the alloy determines the physical properties of thedeposited film. During the evaporation process the number of atoms of both species and thus source, vapor and thin filmcompositions are continuously changed, with possible adverse effects on the film properties. In order to maintain highquality features in mass production of devices and components, it is important to know the mass fraction that may beevaporated without modifying too much the intented composition of the thin film of the binary alloy. The present paperdescribes a theoretical analysis of the evaporation behavior of a molten binary alloy through changes in the chemicalcomposition of the source, the vapor, and the thin film during the process. We employed Roults law to described therelation between partial vapor pressure and composition for an ideal alloy and for the evaporation of pure metals theHertz-Knudsen equation 2000 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94201105 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.11 |
| title | Mole fraction modification of binary alloys during thermal evaporation |
| topic | Física, Astronomía y Matemáticas thin film binary alloys mole fraction vapor pressure |
| url | https://www.redalyc.org/articulo.oa?id=94201105 |