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On metastable properties of plasma treated amorphous Si:H films

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Bibliographic Details
Main Author:	E. Pineík
Format:	Artículo científico
Language:	en
Published:	Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 2001
Subjects:	Física, Astronomía y Matemáticas DLTS Metastability Very thin oxide Structural properties Amorphous semiconductors
Online Access:	Acceder al recurso
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