Charge trapping phenomenon in Al/SRO/Al on Si structure by lateral electrical stress

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1. Verfasser: Yu Zhenrui
Format: Artículo científico
Sprache:en
Veröffentlicht: Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 2003
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_version_ 1876450102057369600
author Yu Zhenrui
author_facet Yu Zhenrui
contents Charge trapping phenomenon in Al/SRO/Al on Si structure by lateral electrical stress Yu Zhenrui Jesús Carrillo Fracisco Flores Mariano Aceves Física, Astronomía y Matemáticas Charge trapping CV measurements Si nanocrystals Silicon rich oxide Lateral electrical stress In this article, the observation of charge trapping effect of silicon rich oxide (SRO) layer in an Al/SRO/Al on Si structureby lateral electrical stress is reported. The density of trapped charges depends on the deposition and post-treatmentconditions of the SRO layer. For the Al/SRO/Al structure grown on n-Si substrates, positive trapped charges wereobserved. A model is proposed to interpret the experimental results 2003 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94216406 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.4 Vol.16
format Artículo científico
id redalyc_94216406
institution Redalyc
language en
publishDate 2003
publisher Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
spellingShingle Charge trapping phenomenon in Al/SRO/Al on Si structure by lateral electrical stress
Yu Zhenrui
Física, Astronomía y Matemáticas
Charge trapping
CV measurements
Si nanocrystals
Silicon rich oxide
Lateral electrical stress
Charge trapping phenomenon in Al/SRO/Al on Si structure by lateral electrical stress Yu Zhenrui Jesús Carrillo Fracisco Flores Mariano Aceves Física, Astronomía y Matemáticas Charge trapping CV measurements Si nanocrystals Silicon rich oxide Lateral electrical stress In this article, the observation of charge trapping effect of silicon rich oxide (SRO) layer in an Al/SRO/Al on Si structureby lateral electrical stress is reported. The density of trapped charges depends on the deposition and post-treatmentconditions of the SRO layer. For the Al/SRO/Al structure grown on n-Si substrates, positive trapped charges wereobserved. A model is proposed to interpret the experimental results 2003 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94216406 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.4 Vol.16
title Charge trapping phenomenon in Al/SRO/Al on Si structure by lateral electrical stress
topic Física, Astronomía y Matemáticas
Charge trapping
CV measurements
Si nanocrystals
Silicon rich oxide
Lateral electrical stress
url https://www.redalyc.org/articulo.oa?id=94216406