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| Format: | Artículo científico |
| Language: | en |
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Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2013
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| Online Access: | https://www.redalyc.org/articulo.oa?id=94229715005 |
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| _version_ | 1866811930277052416 |
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| author | M. A. Camacho-López |
| author_facet | M. A. Camacho-López |
| contents | Characterization of nanostructured SnO2 films deposited by reactive DC-magnetron sputtering M. A. Camacho-López J. R. Galeana-Camacho A. Esparza-García C. Sánchez-Pérez Julien C. M. Física, Astronomía y Matemáticas DC tin oxide raman spectroscopy magnetron sputtering Nanostructured tin oxide thin films were deposited on silicon and glass slides substrates by reactive DC-Magnetron sputtering using a tin target in a mixture of argon and oxygen gases. The substrate temperature was varied in the range from 53 to 243 oC, keeping the other deposition parameters constant. The tin oxide films were characterized by: Scanning Electron Microscopy, Energy Dispersive Spectrometry, X Ray Diffraction, microRaman spectroscopy and UV-VIS spectroscopy. It was found that the substrate temperature has an effect mainly on the structural, morphological and optical properties of the thin films. At 53 and 90 oC the tetragonal crystalline phase was obtained while a mixture of crystalline phases (o-SnO2 and t-SnO2) was obtained at 148, 185 and 243 oC. 2013 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94229715005 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.3 Vol.26 |
| format | Artículo científico |
| id | redalyc_94229715005 |
| language | en |
| publishDate | 2013 |
| publisher | Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. |
| spellingShingle | Characterization of nanostructured SnO2 films deposited by reactive DC-magnetron sputtering M. A. Camacho-López Física, Astronomía y Matemáticas DC tin oxide raman spectroscopy magnetron sputtering Characterization of nanostructured SnO2 films deposited by reactive DC-magnetron sputtering M. A. Camacho-López J. R. Galeana-Camacho A. Esparza-García C. Sánchez-Pérez Julien C. M. Física, Astronomía y Matemáticas DC tin oxide raman spectroscopy magnetron sputtering Nanostructured tin oxide thin films were deposited on silicon and glass slides substrates by reactive DC-Magnetron sputtering using a tin target in a mixture of argon and oxygen gases. The substrate temperature was varied in the range from 53 to 243 oC, keeping the other deposition parameters constant. The tin oxide films were characterized by: Scanning Electron Microscopy, Energy Dispersive Spectrometry, X Ray Diffraction, microRaman spectroscopy and UV-VIS spectroscopy. It was found that the substrate temperature has an effect mainly on the structural, morphological and optical properties of the thin films. At 53 and 90 oC the tetragonal crystalline phase was obtained while a mixture of crystalline phases (o-SnO2 and t-SnO2) was obtained at 148, 185 and 243 oC. 2013 artículo científico 1665-3521 https://www.redalyc.org/articulo.oa?id=94229715005 en http://www.redalyc.org/revista.oa?id=942 Superficies y vacío application/pdf Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Superficies y vacío (México) Num.3 Vol.26 |
| title | Characterization of nanostructured SnO2 films deposited by reactive DC-magnetron sputtering |
| topic | Física, Astronomía y Matemáticas DC tin oxide raman spectroscopy magnetron sputtering |
| url | https://www.redalyc.org/articulo.oa?id=94229715005 |