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Mind the Gap—Imaging Buried Interfaces in Twisted Oxide Moirés

Fuente: Wiley Open Access

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Dettagli Bibliografici
Autori principali:	Harikrishnan KP, Xin Wei, Chia‐Hao Lee, Dasol Yoon, Yonghun Lee, Kevin J. Crust, Yu‐Tsun Shao, Ruijuan Xu, Jong‐Hoon Kang, Ce Liang, Jiwoong Park, Harold Y. Hwang, David A. Muller
Natura:	Artículo Open Access
Pubblicazione:	Wiley 2026
Soggetti:	Advanced Materials
Accesso online:	Acceder al recurso
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