High‐Density Topological Defect Array by Two‐Step Interference Photoalignment

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Main Authors: Sunqian Liu, Inge Nys, Kristiaan Neyts
Format: Artículo Open Access
Published: Wiley 2026
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author Sunqian Liu
Inge Nys
Kristiaan Neyts
author_facet Sunqian Liu
Inge Nys
Kristiaan Neyts
Sunqian Liu
Inge Nys
Kristiaan Neyts
collection Wiley Open Access
contents High‐Density Topological Defect Array by Two‐Step Interference Photoalignment Sunqian Liu Inge Nys Kristiaan Neyts Advanced Materials ABSTRACT With nematic liquid crystal (LC) topological defects can be created that are important for the generation of laser beams with orbital angular momentum. Arrays of defects have been realized through photoalignment, by projecting images of a spatial light modulator or digital mirror device. However, such pixel‐based approaches seriously limit the achievable density of defects. Here, we propose a scalable method based on two‐step interference illumination to achieve a much higher density. In the first step, a rotating director pattern is generated by the interference of two circularly polarized beams. In the second step, amplitude modulation by two‐beam interference is used to rewrite the pattern and introduce the defects. By adjusting the illumination doses and angles of incidence in both steps, 2D defect patterns are obtained, with spacing down to 1.25 micrometer. The resulting disclination lines are analyzed, and the proposed structure is supported by numerical simulations. For the first time, a high defect density defect grid is obtained through a scalable two‐step photoalignment procedure. This approach enables optical components with large‐angle diffraction and bridges the gap between LC topological optics and metasurfaces. 10.1002/adma.72607 http://creativecommons.org/licenses/by/4.0/
doi_str_mv 10.1002/adma.72607
format Artículo Open Access
id wiley_oa_10_1002_adma_72607
institution Wiley Open Access
license_str_mv http://creativecommons.org/licenses/by/4.0/
publishDate 2026
publisher Wiley
record_format wiley_oa
spellingShingle High‐Density Topological Defect Array by Two‐Step Interference Photoalignment
Sunqian Liu
Inge Nys
Kristiaan Neyts
Advanced Materials
High‐Density Topological Defect Array by Two‐Step Interference Photoalignment Sunqian Liu Inge Nys Kristiaan Neyts Advanced Materials ABSTRACT With nematic liquid crystal (LC) topological defects can be created that are important for the generation of laser beams with orbital angular momentum. Arrays of defects have been realized through photoalignment, by projecting images of a spatial light modulator or digital mirror device. However, such pixel‐based approaches seriously limit the achievable density of defects. Here, we propose a scalable method based on two‐step interference illumination to achieve a much higher density. In the first step, a rotating director pattern is generated by the interference of two circularly polarized beams. In the second step, amplitude modulation by two‐beam interference is used to rewrite the pattern and introduce the defects. By adjusting the illumination doses and angles of incidence in both steps, 2D defect patterns are obtained, with spacing down to 1.25 micrometer. The resulting disclination lines are analyzed, and the proposed structure is supported by numerical simulations. For the first time, a high defect density defect grid is obtained through a scalable two‐step photoalignment procedure. This approach enables optical components with large‐angle diffraction and bridges the gap between LC topological optics and metasurfaces. 10.1002/adma.72607 http://creativecommons.org/licenses/by/4.0/
title High‐Density Topological Defect Array by Two‐Step Interference Photoalignment
topic Advanced Materials
url https://advanced.onlinelibrary.wiley.com/doi/10.1002/adma.72607