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In‐situ p‐Doping of Nanometer Tellurium‐based Oxide for Room‐Temperature CMOS Circuits

Fuente: Wiley Open Access

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Bibliographic Details
Main Authors:	Mengfei He, Hamin Choi, Zhikai Le, Xiaomin Yang, Yanlin Huang, Youjin Reo, Sai Bai, Mingyang Wang, Huihui Zhu, Yong‐Young Noh, Ao Liu
Format:	Artículo Open Access
Published:	Wiley 2026
Subjects:	Advanced Materials
Online Access:	Acceder al recurso
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