Two‐Photon Printing of Base‐Catalyzed Resins Involving Thiol‐Michael Network Formation

Fuente: Wiley Open Access

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Bibliographic Details
Main Authors:	Madelyn P. Jeske, Mark J. Bonino, Xi Huang, David R. Harding, Yongfeng Lu, Mitchell Anthamatten
Format:	Artículo Open Access
Published:	Wiley 2024
Subjects:	Advanced Materials Technologies
Online Access:	Acceder al recurso
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