Thermal Design of a Schiff Base Cobalt(II) Precursor: Thermal Stability, Volatility, and Thin Film Deposition of Nanocrystalline Co 3 O 4 by Plasma‐Assisted MOCVD
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Wiley Open Access
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| Main Authors: | , , , , |
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| Format: | Artículo Open Access |
| Published: |
Wiley
2026
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| Subjects: | |
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