Improving the Lithographic Performance of Tetranuclear Organotin Resist via Additives with Active Ligands †

Fuente: Wiley Open Access

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Bibliographic Details
Main Authors:	Hao Li, Huiwen An, Jinping Chen, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Jun Zhao, Yanqing Wu, Xiaolei Wen, Guoqiang Yang, Yi Li
Format:	Artículo Open Access
Published:	Wiley 2025
Subjects:	Chinese Journal of Chemistry
Online Access:	Acceder al recurso
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