Challenges in scaling of IPVD deposited Ta barriers on OSG low‐k films: Carbonization of Ta by CHx radicals generated through VUV‐induced decomposition of carbon‐containing groups

Fuente: Wiley Open Access

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Bibliographic Details
Main Authors:	Alexey N. Ryabinkin, Alexey S. Vishnevskiy, Sergej Naumov, Alexander O. Serov, Konstantin I. Maslakov, Dmitry S. Seregin, Dmitry A. Vorotyntsev, Alexander F. Pal, Tatyana V. Rakhimova, Konstantin A. Vorotilov, Mikhail R. Baklanov
Format:	Artículo Open Access
Published:	Wiley 2024
Subjects:	Plasma Processes and Polymers
Online Access:	Acceder al recurso
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