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35‐1: Invited Paper: High‐quality high‐k ZrO 2 ‐based dielectric film with low leakage current

Fuente: Wiley Open Access

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Dettagli Bibliografici
Autori principali:	Xianzhe Liu, Ao Chen, Zhiying Liao, Huiqi Zhang, Yan Li, Ruihua Wang, Aiping Huang
Natura:	Artículo Open Access
Pubblicazione:	Wiley 2024
Soggetti:	SID Symposium Digest of Technical Papers
Accesso online:	Acceder al recurso
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