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P‐7.22: Pulsed laser deposition of wide‐band gap and low leakage current density hafnium oxide thin films

Fuente: Wiley Open Access

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Detalles Bibliográficos
Autores principales:	Dingrong Liu, Zihan Zhang, Rihui Yao, Guoping Su, Zhenchao Li, Kuankuan Lu, Haoyan Chen, Honglong Ning, Junbiao Peng
Formato:	Artículo Open Access
Publicado:	Wiley 2024
Materias:	SID Symposium Digest of Technical Papers
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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