64‐4: ECR Plasma Source for Copper Thin Film Dry Etching

Fuente: Wiley Open Access

Saved in:

Bibliographic Details
Main Authors:	Jin Nyoung Jang, Jong Hwa Lee, Sangheon Lee, Kiro Jung, Donghoon Kim, Mun-Pyo Hong, Sang-Gab Kim, Soo Ouk Jang, Chiwoo Kim
Format:	Artículo Open Access
Published:	Wiley 2024
Subjects:	SID Symposium Digest of Technical Papers
Online Access:	Acceder al recurso
Tags:	Add Tag No Tags, Be the first to tag this record!

Internet