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P‐21: Post‐Annealing Optimization for Top‐Gate Amorphous In‐Ga‐Zn‐O Thin‐Film Transistors with Atomic‐Layer‐Deposited Ultrathin AlO x Dielectric

Fuente: Wiley Open Access

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Bibliographic Details
Main Authors:	Jiye Li, Huan Yang, Xiao Li, Yuqing Zhang, Xinwei Wang, Lei Lu, Shengdong Zhang
Format:	Artículo Open Access
Published:	Wiley 2024
Subjects:	SID Symposium Digest of Technical Papers
Online Access:	Acceder al recurso
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