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4‐3: Silicon‐Oxide Thin Films Deposited by Plasma‐Enhanced Atomic Layer Deposition for High Mobility Oxide TFT

Fuente: Wiley Open Access

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Dettagli Bibliografici
Autori principali:	Heeyong Lee, Choelmin Jang, Junggon Kim, Myungsoo Huh, Cheollae Roh
Natura:	Artículo Open Access
Pubblicazione:	Wiley 2025
Soggetti:	SID Symposium Digest of Technical Papers
Accesso online:	Acceder al recurso
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