74‐3: Invited Paper: Polycrystalline Indium Oxide Thin‐Film Transistors formed by Solid‐Phase Crystallization
Fuente:
Wiley Open Access
Saved in:
| Main Authors: | Mamoru Furuta, Mir Mutakabbir Alom, Xiaoqian Wang, Yusaku Magari |
|---|---|
| Format: | Artículo Open Access |
| Published: |
Wiley
2025
|
| Subjects: | |
| Online Access: | |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
70‐3: Distinguished Student Paper: Hydrogen‐free Oxide Thin‐Film Transistor Toward Resolving Hydrogen‐Associated Instability
by: Mamoru Furuta, et al.
Published: (2025)
by: Mamoru Furuta, et al.
Published: (2025)
51‐1: Invited Paper: Optimizing Photonic Annealing Technique for Full‐Solution‐Processed Oxide Thin Film Transistor
by: Meng Xu, et al.
Published: (2024)
by: Meng Xu, et al.
Published: (2024)
20‐1: Influence of Tungsten Doping Content on the Reliability of Indium Zinc Oxide Thin‐Film Transistors
by: Bin Wang, et al.
Published: (2025)
by: Bin Wang, et al.
Published: (2025)
54‐4: Invited Paper: Recent Progress, Opportunities and Properties in Polycrystalline Oxide TFTs
by: Gwang-Bok Kim, et al.
Published: (2025)
by: Gwang-Bok Kim, et al.
Published: (2025)
P‐1.20: Investigation of Illumination and Temperature on the Stability of Indium‐Gallium‐Zinc‐Oxide Thin‐Film Transistors
by: Yuli He, et al.
Published: (2025)
by: Yuli He, et al.
Published: (2025)
11‐1: Invited Paper: Relative Gate Placement in Multimodal Thin‐Film Transistors for Negligible Impact on DC Characteristics
by: Atif Niaz, et al.
Published: (2025)
by: Atif Niaz, et al.
Published: (2025)
38‐4: Dynamic On‐State Stress‐Induced Degradation in Polycrystalline Silicon Thin‐Film Transistors
by: Yunyang Wang, et al.
Published: (2025)
by: Yunyang Wang, et al.
Published: (2025)
63‐1: Invited Paper: Thin Film Neuromorphics: Fantasy or Reality?
by: Bowei Jiang, et al.
Published: (2024)
by: Bowei Jiang, et al.
Published: (2024)
11‐3: Positive Shift of the Turn‐On Voltage of Indium‐Gallium‐Zinc Oxide Thin‐Film Transistors with Reduced Active Layer Thickness
by: Runxiao Shi, et al.
Published: (2025)
by: Runxiao Shi, et al.
Published: (2025)
P‐1.25: Non‐Volatile Charge Trap Memory Transistor Employing Indium Tungsten Oxide Thin Film as Active Channel and Charge Trap Layer
by: RuiPeng Shen, et al.
Published: (2025)
by: RuiPeng Shen, et al.
Published: (2025)
1‐1: Oxide Semiconductor Thin‐Film Transistors with High Mobility and Stability
by: Guowen Yan, et al.
Published: (2024)
by: Guowen Yan, et al.
Published: (2024)
P‐22: Fabrication of Ultra Short Channel Oxide Thin Film Transistors
by: Jiangbo Yao, et al.
Published: (2024)
by: Jiangbo Yao, et al.
Published: (2024)
56‐2: The Effects of Oxides Deposited Using Different Precursors on the Characteristics of Top‐Gate Indium‐Tin‐Zinc Oxide Thin‐Film Transistors with Self‐Aligned, Oxygen‐Plasma Activated Source/Drain Regions
by: Xinying Xie, et al.
Published: (2025)
by: Xinying Xie, et al.
Published: (2025)
P‐7.12: High on‐off ratio and Stability Indium Oxide Thin‐film Transistor with Praseodymium and Hetero‐valence molybdenum doping
by: Honglong Ning, et al.
Published: (2025)
by: Honglong Ning, et al.
Published: (2025)
P‐80: Systematic Study on Scanning Direction of Excimer Laser Annealing in p‐Type Low‐Temperature Polycrystalline Silicon Thin‐Film Transistors
by: Qian Xiao, et al.
Published: (2025)
by: Qian Xiao, et al.
Published: (2025)
54‐3: Invited Paper: IGZO‐Based Synaptic Transistors for Neuromorphic Applications
by: Junhyeong Park, et al.
Published: (2025)
by: Junhyeong Park, et al.
Published: (2025)
P‐1.4: High‐Performance Low‐Temperature Polycrystalline Silicon Thin‐Film Transistors Fabricated via a Specific Laser Scanning Direction
by: Peng Dai, et al.
Published: (2025)
by: Peng Dai, et al.
Published: (2025)
P‐17: Development of Vertical Oxide Channel Thin Film Transistor Based on Hard‐Mask Etching
by: Binbin Tong, et al.
Published: (2024)
by: Binbin Tong, et al.
Published: (2024)
22‐1: Invited Paper: About a Trench Oxide TFT
by: Do Hyung Kim, et al.
Published: (2024)
by: Do Hyung Kim, et al.
Published: (2024)
32‐3: Invited Paper: Availability and Sourcing of Cerium, Gallium, Indium and Iridium, Key Critical Materials for the Display Market
by: Guillaume Gélinas
Published: (2025)
by: Guillaume Gélinas
Published: (2025)
28‐2: Invited Paper: Templated Liquid Crystal Photonic Devices
by: Changli Sun, et al.
Published: (2024)
by: Changli Sun, et al.
Published: (2024)
17‐1: Persistent Photoconductivity Suppression in Amorphous Oxide Thin‐Film Transistors with Double‐Stacked Channel Layers
by: Liangdong Li, et al.
Published: (2024)
by: Liangdong Li, et al.
Published: (2024)
P‐1.5: Thermal Stability of Short‐Channel Elevated‐Metal Metal‐Oxide Thin‐Film Transistors
by: Yujie Jiang, et al.
Published: (2025)
by: Yujie Jiang, et al.
Published: (2025)
86‐1: Invited Paper: Ferroelectric Nematic Liquid Crystals: Mixtures and Applications
by: Carsten Fritzsch, et al.
Published: (2025)
by: Carsten Fritzsch, et al.
Published: (2025)
97‐1: Late‐News Paper: Mechanism for the Irreversible Threshold Voltage Behavior by Polyimide Charging in Thin Film Transistors
by: Do Hyung Kim, et al.
Published: (2024)
by: Do Hyung Kim, et al.
Published: (2024)
P‐1.34: Recent Developments in Vertial Amorphous Oxide Semiconductor (AOS) Thin‐Film Transistor (TFT) Devices
by: Qianqian Bu, et al.
Published: (2025)
by: Qianqian Bu, et al.
Published: (2025)
P‐1.20: Stability of Hydrogenated Amorphous Silicon Thin‐Film Transistors in High‐Brightness Liquid Crystal Displays
by: ZhiXin Sun, et al.
Published: (2024)
by: ZhiXin Sun, et al.
Published: (2024)
27‐1: Invited Paper: CCZA Copper Alloy Electrodes for Metal Oxide TFT
by: Ning Honglong, et al.
Published: (2025)
by: Ning Honglong, et al.
Published: (2025)
75‐1: Invited Paper: Liquid Crystal Polarization Hologram for Eye Tracking Application
by: Hsien-Hui Cheng, et al.
Published: (2024)
by: Hsien-Hui Cheng, et al.
Published: (2024)
54‐1: Invited Paper: Recent Progress in the Application of Liquid Crystal Dimming Glass
by: Yanpeng Xue, et al.
Published: (2025)
by: Yanpeng Xue, et al.
Published: (2025)
49‐2: Invited Paper: High Performance Cholesteric Liquid Crystal Technology Development
by: HengYi Tseng, et al.
Published: (2024)
by: HengYi Tseng, et al.
Published: (2024)
77‐1: Invited Paper: Towards Commercialization of Vertical, Organic Light‐emittingTransistors for Active‐Matrix Displays
by: Svetlana Vasilyeva, et al.
Published: (2024)
by: Svetlana Vasilyeva, et al.
Published: (2024)
44‐2: Invited Paper: Liquid Crystal Photoalignment by Azodye Nanolayers: New Liquid Crystal Photonics Devices
by: Vladimir G. Chigrinov, et al.
Published: (2024)
by: Vladimir G. Chigrinov, et al.
Published: (2024)
P‐68: Oxide Semiconductor Thin‐Film Transistor‐Based Micro‐LED Pixel Circuit with External Current Setting System
by: Hye-Won Woo, et al.
Published: (2024)
by: Hye-Won Woo, et al.
Published: (2024)
P‐1.12: Sub‐200nm Nano‐scale Indium‐Zinc‐Oxide Ultra‐thin Channel Transistors
by: Minghe Zhang, et al.
Published: (2024)
by: Minghe Zhang, et al.
Published: (2024)
62‐3: Invited Paper: High‐Mobility Metal‐Oxide TFT Development for IT AMOLED Applications
by: Fa-Hsyang Chen, et al.
Published: (2025)
by: Fa-Hsyang Chen, et al.
Published: (2025)
19‐2: Invited Paper: Transparent Electrodes Based on Wide‐gap Oxide Multilayer Structures
by: Aslan Abduev, et al.
Published: (2024)
by: Aslan Abduev, et al.
Published: (2024)
15‐2: Invited Paper: Development of Novel Liquid Crystal on Silicon Microdisplays and Future Application
by: Yoshitomo Isomae, et al.
Published: (2024)
by: Yoshitomo Isomae, et al.
Published: (2024)
67‐2: Invited Paper: Displayable Liquid Crystal Glasses with Clear See‐Through Vision
by: Hung-Shan Chen, et al.
Published: (2024)
by: Hung-Shan Chen, et al.
Published: (2024)
P‐1.11: Back‐End‐of‐Line Compatible Al‐doped Indium Zinc Oxide Transistors with Excellent Thermal Stability
by: Jingye Xie, et al.
Published: (2024)
by: Jingye Xie, et al.
Published: (2024)
Similar Items
-
70‐3: Distinguished Student Paper: Hydrogen‐free Oxide Thin‐Film Transistor Toward Resolving Hydrogen‐Associated Instability
by: Mamoru Furuta, et al.
Published: (2025) -
51‐1: Invited Paper: Optimizing Photonic Annealing Technique for Full‐Solution‐Processed Oxide Thin Film Transistor
by: Meng Xu, et al.
Published: (2024) -
20‐1: Influence of Tungsten Doping Content on the Reliability of Indium Zinc Oxide Thin‐Film Transistors
by: Bin Wang, et al.
Published: (2025) -
54‐4: Invited Paper: Recent Progress, Opportunities and Properties in Polycrystalline Oxide TFTs
by: Gwang-Bok Kim, et al.
Published: (2025) -
P‐1.20: Investigation of Illumination and Temperature on the Stability of Indium‐Gallium‐Zinc‐Oxide Thin‐Film Transistors
by: Yuli He, et al.
Published: (2025)