Determination of the Generation Depth of Ultra‐Soft X‐Ray Si L 2,3 Emission in a Thin SiO 2 Film Under Electron Beam Irradiation

Fuente: Wiley Open Access

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Bibliographic Details
Main Authors:	Tran Van Tu, E. S. Kersnovsky, I. V. Polshin, Y. A. Peshkov, S. A. Ivkov, A. A. Skidanov, K. A. Barkov
Format:	Artículo Open Access
Published:	Wiley 2026
Subjects:	Surface and Interface Analysis
Online Access:	Acceder al recurso
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