Chemical and Electronic Structure of Buried W/Cu, W/Cr, and W/Mo Interfaces by In Situ XPS/HAXPES Auger Parameter Analysis

Fuente: Wiley Open Access

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Bibliographic Details
Main Authors:	Claudia Cancellieri, Giacomo Lorenzin, Manura Lyanage, Vladyslav Turlo, John F. Watts, Lars P. H. Jeurgens
Format:	Artículo Open Access
Published:	Wiley 2025
Subjects:	Surface and Interface Analysis
Online Access:	Acceder al recurso
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