Synergistic Effects of Nitrogen–Oxygen–Nitrogen, Forming Gas–Oxygen–Forming Gas, and Argon–Oxygen–Argon Annealing Ambient on the Structural and Electrical Characteristics of Thulium Oxide Passivation Layers on Silicon Substrate

Fuente: Wiley Open Access
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Bibliographic Details
Main Authors: Junchen Deng, Hock Jin Quah
Format: Artículo Open Access
Published: Wiley 2025
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