Vishwakarma, K., Kaczer, B., Smets, Q., Panarella, L., Kruv, A., Schram, T., . . . De Wolf, I. (2025). Observation of Fully Recoverable Leakage Behaviour in HfO2 Gate Oxide of WS2 2D FETs Induced by Local Mechanical Stress. Zenodo.
Chicago-Zitierstil (17. Ausg.)Vishwakarma, Kavita, et al. Observation of Fully Recoverable Leakage Behaviour in HfO2 Gate Oxide of WS2 2D FETs Induced by Local Mechanical Stress. Zenodo, 2025.
MLA-Zitierstil (9. Ausg.)Vishwakarma, Kavita, et al. Observation of Fully Recoverable Leakage Behaviour in HfO2 Gate Oxide of WS2 2D FETs Induced by Local Mechanical Stress. Zenodo, 2025.
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