国产EUV光刻机5nm及以下制程核心参数优化补充方案

Fuente: Zenodo

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Bibliographic Details
Main Author:	卞, 振峰
Format:	Recurso digital
Language:	Chinese
Published:	Zenodo 2026
Subjects:	跨尺度力统一理论,EUV光刻机,5nm制程,核心参数优化,供片适配,中试量产,光刻胶适配,光源稳定性,反射镜污染控制,卞氏万物统一场频公式(F_q),双能场协同规律,半导体装备,工程技术,半导体科学与技术,应用物理学,凝聚态物理学 Cross-Scale Force Unification;Domestic EUV Lithography;5nm Process;Core Parameter Optimization;Wafer Supply Adaptation;Pilot Mass Production;Photoresist Adaptation;Light Source Stability;Mirror Contamination Control;Bian's Unified Field Frequency Formula (F_q);Dual-Energy Field Synergy;Semiconductor Equipment;Engineering Technology;Semiconductor Science and Technology;Applied Physics;Condensed Matter Physics
Online Access:	Acceder al recurso
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