Next Generation Lithographic Nanofabrication Achieving sub- 10 nm resolution and true volumetric control. Computer-generated holograms (CGHs), multi-beam interference lithography, and their convergence with two-photon poly- merization and stimulated emission depletion (STED) microscopy-inspired methods. Cross- disciplinary innovations in metamaterials, quantum photonics, and biomedical scaffolds are a forward-looking roadmap for atomic-precision manufacturing next-generation nanofabrication.