APA (7th ed.) Citation

Fuchs, C., Fürst, L., Buhmann, H., Kleinlein, J., & Molenkamp, L. W. (2024). Overlapping Top Gate Electrodes based on Low Temperature Atomic Layer Deposition for Nanoscale Ambipolar Lateral Junctions.

Chicago Style (17th ed.) Citation

Fuchs, Christopher, Lena Fürst, Hartmut Buhmann, Johannes Kleinlein, and Laurens W. Molenkamp. Overlapping Top Gate Electrodes Based on Low Temperature Atomic Layer Deposition for Nanoscale Ambipolar Lateral Junctions. 2024.

MLA (9th ed.) Citation

Fuchs, Christopher, et al. Overlapping Top Gate Electrodes Based on Low Temperature Atomic Layer Deposition for Nanoscale Ambipolar Lateral Junctions. 2024.