Cita APA (7a ed.)

Bose, S., Sinha, A., & Ghosh, S. (2024). In Situ Growth of Copper Channels within CuCl and PVDF Composite for Durable WORM Device Formation.

Cita Chicago Style (17a ed.)

Bose, Shilpi, Aloka Sinha, y Santanu Ghosh. In Situ Growth of Copper Channels Within CuCl and PVDF Composite for Durable WORM Device Formation. 2024.

Cita MLA (9a ed.)

Bose, Shilpi, et al. In Situ Growth of Copper Channels Within CuCl and PVDF Composite for Durable WORM Device Formation. 2024.