Cita APA (7a ed.)

Atmane, S., Alexandre, M., Caillard, A., Thomann, A., Kateb, M., Gudmundsson, J. T., & Brault, P. (2024). The role of sputtered atom and ion energy distribution in films deposited by Physical Vapor Deposition: A molecular dynamics approach.

Cita Chicago Style (17a ed.)

Atmane, Soumya, Maroussiak Alexandre, Amaël Caillard, Anne-Lise Thomann, Movaffaq Kateb, Jón Tómas Gudmundsson, y Pascal Brault. The Role of Sputtered Atom and Ion Energy Distribution in Films Deposited by Physical Vapor Deposition: A Molecular Dynamics Approach. 2024.

Cita MLA (9a ed.)

Atmane, Soumya, et al. The Role of Sputtered Atom and Ion Energy Distribution in Films Deposited by Physical Vapor Deposition: A Molecular Dynamics Approach. 2024.