Bhat, A., Gilgenbach, C., Kim, J., Xu, M., Zhu, M., & LeBeau, J. M. (2024). Sensitivity of Multislice Electron Ptychography to Point Defects: A Case Study in SiC.
Citazione stile Chigago Style (17a edizione)Bhat, Aaditya, Colin Gilgenbach, Junghwa Kim, Michael Xu, Menglin Zhu, e James M. LeBeau. Sensitivity of Multislice Electron Ptychography to Point Defects: A Case Study in SiC. 2024.
Citatione MLA (9a ed.)Bhat, Aaditya, et al. Sensitivity of Multislice Electron Ptychography to Point Defects: A Case Study in SiC. 2024.
Attenzione: Queste citazioni potrebbero non essere precise al 100%.