APA (7th ed.) Citation

Liu, Y., Wang, Y., Fan, Z., Wei, J., Guo, S., Su, Z., & Dan, Y. (2024). Reproducible Monolayer MoS2 Devices Free of Resist Contamination by Gold Mask Lithography.

Chicago Style (17th ed.) Citation

Liu, Yumeng, Yizhuo Wang, Zhengfang Fan, Jianyong Wei, Shuwen Guo, Zhijuan Su, and Yaping Dan. Reproducible Monolayer MoS2 Devices Free of Resist Contamination by Gold Mask Lithography. 2024.

MLA (9th ed.) Citation

Liu, Yumeng, et al. Reproducible Monolayer MoS2 Devices Free of Resist Contamination by Gold Mask Lithography. 2024.